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CP90WH20-OR-006
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CS

0.070 in

(1.78 mm)

ID

0.114 in

(2.90 mm)

ORing cut reference

FFKM Canrez CP90WH20 O-Ring, Size: -006

Material: FFKM Canrez CP90WH20 O-Ring

Size: AS568 -006 O-Ring

Part Number: CP90WH20-OR-006

CanRez® (Canyon Components)

CP90WH20

FFKM (Perfluoroelastomer)

90

Shore A

Low Temperature Material

Color: White

Detailed Description

CP90WH20-OR-006 is a White, 90 Shore A, FFKM (Perfluoroelastomer) O-Ring made from CanRez® (Canyon Components). CanRez® (Canyon Components) CP90WH20 is manufactured with the following features & specifications: Low Temperature Material. CP90WH20-OR-006 is AS568 size -006 O-Ring also referred to as 1.78mm (Cross Sectional Diameter (CS)) x 2.9mm (Inside Diameter (ID)).


Material: FFKM Canrez CP90WH20 O-Ring


Size: AS568 -006, 1.78mm CS X 2.90mm ID (0.070" CS X 0.114" ID)

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Technical SpecificationValue
Compound NumberCP90WH20
BrandCanRez® (Canyon Components)
MaterialFFKM (Perfluoroelastomer)
ColorWhite
Durometer90 Shore A
High Temperature240 °C / 464 °F
Low Temperature-30 °C / -22 °F
Geometry Specifications
Cross Sectional GeometryO-Ring
Size StandardAS568
Size-006
Cross Section (CS)1.78 mm / 0.070 in
Inside Diameter (ID)2.90 mm / 0.114 in
ORing cut reference
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Canrez® CP90WH20 is a 90 Shore A white, high-purity FFKM compound engineered specifically for semiconductor manufacturing and plasma process environments. It provides near-universal chemical resistance and outstanding stability in both static and dynamic sealing applications exposed to aggressive plasma, vacuum, and diffusion conditions. Designed for clean, contamination-free performance, CP90WH20 offers high durometer strength, resistance to explosive decompression, and long-term durability under high-temperature operation. With a service temperature range of -30°C to 240°C (-22°F to 464°F), it delivers reliable sealing integrity across a wide range of semiconductor processing conditions.

 

CP90WH20 is ideal for use in semiconductor dry and wet processes including ashing, etching, polishing, PVD, CVD, PECVD, LPCVD, SACVD, HDPCVD, and oxidation, as well as wafer cleaning, lithography, lamp anneal, and EPI + SiGe applications. Its purity and mechanical strength make it suitable for both static chamber seals and dynamic motion components. This Canrez® formulation combines plasma resistance, high purity, and mechanical resilience to provide consistent, clean sealing performance in advanced semiconductor manufacturing environments.