FF376-80 Datasheet

Parker’s FF376-80 is an 80 Shore A deep-purple perfluoroelastomer (FFKM) developed for ultra-low particle generation and minimal extractables in the most demanding semiconductor plasma environments. As a Parofluor ULTRA material, FF376-80 contains no inorganic filler systems and no phosphorus, resulting in extremely low metallic ion content and among the lowest extractable levels in its class. Rated for continuous operation up to 600°F (315°C), it delivers a low erosion rate with excellent resistance to aggressive oxygen and fluorine plasmas while providing higher hardness for improved dimensional stability and extrusion resistance. This balance of purity and robustness makes FF376-80 well suited for processes where both cleanliness and mechanical strength are critical to yield.

 

FF376-80 is recommended for O-rings and molded shapes used in deposition and etch applications including CVD, HDPCVD, SACVD, PECVD, and etching or ashing. Typical uses include chamber seals, slit valve and gate valve doors, ISO valves, wafer pads, target lids, heater and lamp assemblies, and quartz window seals where particle control and plasma durability are paramount. Canyon Components offers equivalent ultra-low-extractable, low-particle FFKM materials engineered for semiconductor deposition and plasma applications requiring comparable purity, plasma resistance, and high-temperature capability.

 

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